Fusion Scans
All earnings

ASML

Q1 2026Apr 15, 2026
Explicit Guidance Increase

ASML delivered a strong Q1 2026 financial performance, aligning with or exceeding prior guidance, and provided an optimistic outlook for the remainder of the year. The company maintained confidence in its growth trajectory amidst record-high demand in the semiconductor industry driven by AI and advanced logic investments. Management raised the full-year revenue outlook from EUR 36 billion to EUR 40 billion, citing robust customer capital expenditure and capacity expansion efforts.

  • Q1 2026 net sales EUR 8.8 billion, in guidance, with EUR 2.5 billion from Installed Base
  • Q1 gross margin 53%, at high end of guidance
  • Full-year 2026 revenue forecast increased to EUR 36–40 billion
  • Gross margin for 2026 maintained at 51–53%
  • Full-year net income guidance not explicitly provided but implied to be strong
R.J.M. Dassen stated, “We are looking at a strong growth year, and based on all the customer dynamics, we expect EUR 36 billion to EUR 40 billion in revenue for 2026.”
Q&A: Jim Kavanagh asked about further capacity expansion, and Dassen responded, “We believe we can drive an output of at least 60 EUV Low NA systems for 2026, and we are also increasing our immersion deep UV output; despite a slow start, we expect to reach comparable sales to last year.”
Strong Call

ASML's outlook remains highly optimistic, reflecting broad-based strength across multiple facets of its business. The company anticipates sustained high demand in the semiconductor lithography market driven by AI and next-generation logic, with capacity expansions aligned to customer needs. Management highlighted record customer capacity additions and technological advancements, underpinning the bullish tone of the call.

  • Customer semiconductor investments already sold out for 2026, with demand expected to extend beyond
  • Capacity ramp-up plans include over 60 EUV systems in 2026 and over 80 systems for 2027
  • Customer adoption of EUV and immersion lithography continues to accelerate
  • Increased wafer throughput rates for key systems, supporting capacity growth
Christophe Fouquet emphasized, “Customers are increasing their capacity ramp and adopting EUV more than ever, supporting our optimistic outlook for capacity increase in 2026 and beyond.”
Q&A: Jim Kavanagh queried about capacity plans; Dassen confirmed, “We’re fully aligned with customers, and for 2026, we’re targeting at least 60 EUV Low NA systems, with further growth in 2027.”
Technology & Roadmap Progress

ASML continues to demonstrate technological leadership with major milestones in EUV developments. The firm showcased the 1,000-watt light source, promising extended EUV system extendibility beyond 2031, and increased throughput on current platforms to meet short-term demand. Progress in High NA EUV technology was also highlighted, with customer-reported reductions in mask counts and process steps, indicating readiness for subsequent manufacturing nodes.

  • Demonstrated 1,000-watt EUV source; enables 2031 roadmap of 330 wafers/hour
  • Increased NXE:3800E throughput from 220 to 230 wafers/hour; NXE:3800F expected to reach 260 wafers/hour
  • High NA EUV reduces masks from 3 to 1, and process steps from 100 to 10 for customers
  • High NA tools extendable to 18 nm logic and 28 nm memory nodes
Christophe Fouquet noted, “The 1,000-watt source secures the extendibility of EUV well into the next decade, supporting our technological roadmap.”
Q&A: During the call, Fouquet highlighted the progress of High NA and its ecosystem, with customers adopting these tools for next-generation nodes, indicating readiness for high-volume production.
Full transcript
**Jim Kavanagh:**  
Hello, and welcome to ASML's Q1 2026 results video. Welcome, Christophe and Roger.

**Jim Kavanagh:**  
Roger, if I could start with you and ask you to give us a summary of our Q1 2026 results.

R.J.M. Dassen: For the quarter, total net sales came in at EUR 8.8 billion. That was within guidance. Included in the EUR 8.8 billion was EUR 2.5 billion for Installed Base revenue. That was a little bit above the guidance. If you look at the gross margin for Q1, 53%. That was at the high end of the gross margin that we guided. If you look at the Installed Base business, as I just mentioned, the Installed Base business was higher than we anticipated. But also if you look at the components in the Installed Base business, there were components in there that actually come in at quite some strong gross margins. So as a result of that, a pretty high gross margin at 53%. Net income for the quarter, EUR 2.8 billion.  

**Jim Kavanagh:**  
Can you also provide us with a guide for Q2 '26 results, please?

R.J.M. Dassen: For Q2, we expect EUR 8.4 billion to EUR 9 billion of total net sales. Included in there, again, EUR 2.5 billion of Installed Base business. We expect the gross margin to be between 51% and 52%.  

**Jim Kavanagh:**  
Christophe, if I can switch to you. And can I ask you to give us an outlook on the market and how you're seeing things at the moment?

**Christophe Fouquet:**  
Well, I think we see that the semiconductor industry growth continued to solidify. This is still very much driven by investment in AI infrastructure. So this translates into a lot of demand for advanced memory, for advanced logic. And we expect, in fact, that the supply will not meet the demand for the foreseeable future. So this is creating a strong constraint in the end market from AI to mobile and PC. And as a result, our customers are strongly invited to create more capacity. So if we look at memory, what our customers tell us is that they are sold out for 2026 and their supply constraint will last beyond 2026. For advanced logic, we see our customer building capacity for several nodes, while they also continue to ramp 2-nanometer in order to address the AI products.

**Jim Kavanagh:**  
So then I guess it's fair to say, a lot of those capacity additions are adding positively to our own outlook?

**Christophe Fouquet:**  
Well, absolutely, we see our memory and logic customers increasing their capital expenditure and trying to accelerate basically their capacity ramp in 2026 and beyond. What's also very interesting is that a lot of this demand is supported by long-term commitment at their customer. On top of that, we see both memory customers, DRAM customers and advanced logic customers continuing to increase their adoption of EUV but also immersion. So this translates basically into higher litho intensity and a higher litho demand for ASML. So we're going to continue to work very closely with our customers to increase our capacity. We are doing that in 2026. We'll continue to do that in 2027.

**Jim Kavanagh:**  
And then maybe Roger, just adding on to that, can you provide a little bit more color or details on what we are actually going to do in terms of adding capacity to support market demand?

R.J.M. Dassen: So I think Christophe said it right. We're very clearly working with our customers, fully aligned with customers to give them what they need, and that is in a combination of capacity in terms of new shipments, making sure that systems, that the performance of systems is upgraded as best as we can and also provide Installed Base products. So in that combination, we try to give customers what they need, specifically when it comes to our own capacity. What we're looking at for this year for 2026, we believe we can drive an output for this year of at least 60 systems for EUV Low NA. That's what we currently have. That's what we're currently driving. And added to that, we're looking at deep UV for 2026. As I mentioned a couple of months ago, when it comes to immersion deep UV, we actually had a bit of a slow start because in the course of last year, we decided to actually -- we were looking at a significantly lower demand for immersion. That has now reversed itself. And I would say in spite of that slow start, we're still for this year expecting to get pretty close to the immersion sales that we had last year in terms of unit numbers. So that's for 2026. When it comes to 2027, in terms of capability, we're increasing our move rate really quarter-on-quarter. And then when you look specifically at EUV Low NA, we expect that we're able to get to an output for 2027. Again, if customer demand really underpins that, we think that we can get to at least 80 Low NA EUV units. And we're also looking at having the non-EUV business being in line with what customers are asking for, for all of their nodes.  

**Jim Kavanagh:**  
And then specifically on 2026. Can you give us an update then on our own business then for the full year?

R.J.M. Dassen: Yes. So clearly, 2026 is panning out very nicely. It's a very strong year. We're looking at a strong growth year. And based on all the customer dynamics that Christophe was talking about, we are actually narrowing the window and also increasing the window of our expectation to EUR 36 billion to EUR 40 billion for this year. If you look at the different moving parts as we already expected, EUV is strong this year. So EUV in combination of Low NA and High NA, strong year there. On the non-EUV business, previously, we were expecting that to be flat in comparison to last year. Right now, what we're looking at is, in fact, an increase of demand there as well. So increased revenue on the non-EUV business is what we're expecting. I already mentioned what we're doing on immersion, but also the dry business is doing quite nicely and also the application business. So we believe in contrast to where we were a couple of months ago, we're looking at an increase for the non-EUV business. When it comes to the Installed Base business, strong growth there because obviously, it is a very fast way for our customers to increase their capacity to cater to the demand that Christophe was talking about. And I would say that within the guidance that we provided, the EUR 36 billion to EUR 40 billion, we believe we can accommodate potential outcomes of the export control discussions that are currently ongoing.  

**Jim Kavanagh:**  
And how about the gross margin then for 2026?

R.J.M. Dassen: For the gross margin, we maintain our expectation of 51% to 53%.  

**Jim Kavanagh:**  
Switching gears a bit to technology. Christophe, can you give us some insights and latest updates on how we're progressing with the technology and our road map?

**Christophe Fouquet:**  
Yes, I think we continue to execute very nicely on our technology road map. I think every year, we use the SPIE conference to give a bit of an update to the entire world about what we have achieved. A few, I think, important news this year. The first one was our demonstration of the 1,000-watt source. And this is very important because it means that we can secure the extendibility of Low NA EUV for many, many years. It means, in fact, that in 2031, we'll be able to run this tool at 330 wafers per hour, which is a major step-up from what we have today. Now the progress on EUV also has a good impact on the short term. We have been able to increase the throughput of our NXE:3800E from 220 to 230 wafers per hour, which is also helping on the short term with capacity. Our customers are very happy to be able to get more wafers out on any tool. And we are also increasing the specs of our next system, the NXE:3800F to 260 wafers per hour. It used to be 250 wafers per hour, and this will help us also with capacity around 2028.

**Jim Kavanagh:**  
And I think also at SPIE, there were some updates on our High NA platform progress. Can you share a little there?

**Christophe Fouquet:**  
Yes. And I think what was good about SPIE is that our customers start to talk about High NA. And they reported a few things. The first thing is, of course, the fact that High NA can allow them to reduce the number of masks significantly. DRAM and logic customers were talking about going from 3 to 1 mask for EUV using High NA. And they also mentioned that this can reduce the number of process steps from 100 to 10, which is, of course, significant. That's, of course, the reason why we have High NA. I think we have seen also great progress on the ecosystem, some good presentation with some of our resist partners, pointing to the fact that High NA can be extended when it comes to logic to 18-nanometer line and space pitch. And when it comes to memory to 28-nanometer hole size. So it means basically that not only High NA is getting ready for prime time, but we already know that High NA can be extended mostly for 3, 4 nodes, which is, of course, very important for our customers. And finally, maturity of the tool is important. We continue to see better availability data, more wafers per day, more wafers out. And this is just, of course, becoming more and more important as we see our customers starting to test High NA on real products.

**Jim Kavanagh:**  
So I'd like to thank you both for joining us today. And yes, thanks very much.

R.J.M. Dassen: Pleasure.